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Abstracts

Abstract Deadline January 12, 2026

Opens November 10, 2025

Note: there are currently no plans for audio or video recording; however, the copyright form language is included as a precautionary measure, but you would be notified in advance should this change.

Abstract Submission Guidelines

Before signing up or logging into the online system, please review all of the following steps to ensure you have the information needed to complete the Online Abstract Submission Form.

  • Step 1

    Please Note the Following Requirements Prior to Submission:

    1. If you are planning to submit multiple abstracts, presenters are limited to one oral and one poster presentation for the Conference. They must be two DIFFERENT abstracts – not the same abstract submitted as both an oral and a poster.
    2. You will need to agree to the copyright agreement. Note: there are currently no plans for audio or video recording; however, this language is included as a precautionary measure, but you would be notified in advance should this change.

  • Step 2

    Select a topic that best matches your abstract from the list below with the understanding that your abstract may fit well in multiple topics.

  • Step 3

    Fill out the abstract content and author details in the system (abstract 2,700 characters max. including punctuation and spacing; you may also submit a supplemental 1-2 pages PDF file containing any graphs, charts or pictures you wish to include).

  • Step 4

    Please click the Submit Abstract button below and complete the Online Abstract Submission Form. 

    Questions? E-mail della@avs.org.

    SUBMIT ABSTRACT

Conference Topics

The conference will cover a wide range of topics including the following:

  • Processes and mechanisms for area-selective chemical vapor deposition (CVD)
  • Processes and mechanisms area-selective atomic layer deposition (ALD)
  • Selectivity in thin film etching, including atomic layer etching (ALE)
  • Mechanisms and surface-dependent thin film nucleation and growth
  • Surface passivation for controlled nucleation and growth
  • Patterned deposition resists, including organic monolayers, for selective deposition
  • Metrology for Area-Selective Deposition
  • Applications for area-selective deposition in IC:  ASD for bottom-up fill, ASD for memory, ASD for 2D devices…
  • Applications for area-selective processing in catalysis, energy generation and storage, and other emerging areas
  • Selective deposition of and on 2D materials
  • Topographical Selective Deposition
  • ASD and sustainability
  • AI and machine learning for ASD
  • Selective Infiltration
  • Self-Assembly structures
  • Selective epitaxial growth of semiconductors

Author Notification

Acknowledgment that your abstract has been submitted will follow by e-mail shortly after submission. Notifications regarding acceptance will be sent by e-mail by February 19, 2026.