Technical Program

Technical Program

The ASD Workshop was initiated in 2016 to provide a scientific communication channel to learn and exchange about selective deposition techniques. It has since offered a forum for open discussions between researchers from academia and industry. The meeting will include one day of Tutorials followed by the Workshop at ETEC Building (University at Albany). The last day of the workshop will highlight the state of the art of SC devices and processes at NY state with invited presentation from our main industrial partners at the NY CREATES’ Albany NanoTech Complex.

The 2026 Area Selective Deposition Workshop (ASD 2026) will take place March 29-April 1, 2026, at the University at Albany in New York, but it will be in two different locations:

• March 29-31, 2026: ETEC Building
• April 1, 2026: NY CREATES’ Albany NanoTech Complex

Keynote Speaker

“From Concept to Reality: The Evolution and Impact of Area Selective ALD”

Prof. Stacey Bent, Stanford University, USA

Invited Speakers

“Development of Area-Selective ALD Processes Using In Situ Optical Diagnostics”

Prof. Sumit Agarwal, Colorado School of Mines, USA

“Direct Integration of Transition Metal Dichalcogenides”

Prof. Zakaria Y. Al Balushi, University of California, Berkley, USA

“Versatile Strategies for ASD Optimization Using Super-Cycles”

Prof. Marceline Bonvalot, Grenoble Alpes University, LTM, France

“Atomic-level Healing and Sculpting: The New Frontier of Area-Selective Deposition in Memory Fabrication”

Dr. Francois Fabreguette, Micron, USA

“Enabling Area-Selective Atomic Layer Deposition through Locally Activated and Deactivated Approaches”

Prof. Woo-Hee Kim, Hanyang University ERICA, South Korea

“Accelerating Future Logic Devices with Precision Area Selective Deposition”

Dr. Yamato Tonegawa, TEL TTS, Japan

“Area-Selective ALD with Polymer Masks: Deposition Mechanisms and Trade-offs”

Dr. Katherine T. Young, Georgia Tech Research Institute, USA

Tutorial Speakers

“Direct Self-Assembly (DSA): From Materials to Integration”

Dr. Patricia Pimenta-Barros, CEA/LETI, France

“Selective Thermal Atomic Layer Etching or Spontaneous Etching”

Marcel Junige, M.Sc., University of Colorado Boulder, USA

“Selectivity in Plasma Processes”

Dr. Eric Liu, TEL TTCA, USA

“Selective Epitaxy Growth of Group IV Materials for CMOS Devices”

Dr. Joël Kanyandekwe, CEA/LETI, France